Kazan (Volga region) Federal University, KFU
KAZAN
FEDERAL UNIVERSITY
 
202. N.I. NURGAZIZOV, A.A. BUKHARAEV, ROZA M.AMINOVA AND D.V.OVCHINNIKOV. INVESTIGATION OF DISSOLUTION PROCESS OF IMPLANTED SILICON DIOXIDE. PROCEEDINGS OF INTERNATIONAL CONFERENCE “MICRO- AND NANOELECTRONICS - 2003” (ICMNE-2003), ZVENIGOROD, MOSKOW DISTRICT, OCTOBER 6-10, 2003. С. 203. NIAZ I. NURGAZIZOV, ANASTAS A. BUKHARAEV, ROZA M.AMINOVA AND DENIS V.OVCHINNIKOV. INVESTIGATION OF DISSOLUTION PROCESS OF IMPLANTED SILICON DIOXIDE. PROCEEDINGS OF SPIE, MICRO- AND NANOELECTRONICS –2003 , VOL. 5401, PP. 147-154 (2003).
Form of presentationArticles in international journals and collections
Year of publication2003
  • Aminova Roza Mukhametovna, author
  • Bukharaev Anastas Akhmetovich, author
  • Bibliographic description in the original language 202. Niaz I. Nurgazizov, Anastas A. Bukharaev, Roza M.Aminova and Denis V.Ovchinnikov. Investigation of dissolution process of implanted silicon dioxide. Proceedings of International Conference “Micro- and Nanoelectronics - 2003” (ICMNE-2003), Zvenigorod, Moskow district, October 6-10, 2003. S. 203. Niaz I. Nurgazizov, Anastas A. Bukharaev, Roza M.Aminova and Denis V.Ovchinnikov. Investigation of dissolution process of implanted silicon dioxide. Proceedings of SPIE, Micro- and Nanoelectronics –2003 , vol. 5401, pp. 147-154 (2003).
    Annotation Proceedings of Spie
    Keywords диоксид кремния, теория функционала плотности
    The name of the journal Proceedings of Spie
    Please use this ID to quote from or refer to the card https://repository.kpfu.ru/eng/?p_id=78899&p_lang=2

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