KFU. Card publication. Effect of substrate rotation on the growth behavior and topography of the Ti film deposited over a large area using DC magnetron sputtering with a rectangular target: Simulation approach and experiment

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EFFECT OF SUBSTRATE ROTATION ON THE GROWTH BEHAVIOR AND TOPOGRAPHY OF THE TI FILM DEPOSITED OVER A LARGE AREA USING DC MAGNETRON SPUTTERING WITH A RECTANGULAR TARGET: SIMULATION APPROACH AND EXPERIMENT

Form of presentation

Articles in international journals and collections

Year of publication

2024

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Authors, employees of KFU

Kashapov Nail Faikovich, author

Luchkin Aleksandr Grigorevich, author

Bibliographic description in the original language

Ayachi Omar A, Ayachi Amar C, Kashapov N.F, Effect of substrate rotation on the growth behavior and topography of the Ti film deposited over a large area using DC magnetron sputtering with a rectangular target: Simulation approach and experiment//Materials Today Communications. - 2024. - Vol.41, Is.. - Art. �110895.

Keywords

Simulation approach and experiment,

The name of the journal

Materials Today Communications

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85208260058&doi=10.1016%2fj.mtcomm.2024.110895&partnerID=40&md5=d1515ab7beb59a4f652f6b9fbe760d9a

Please use this ID to quote from or refer to the card

https://repository.kpfu.ru/eng/?p_id=308898&p_lang=2

Full metadata record

Field DC	Value	Language
dc.contributor.author	Kashapov Nail Faikovich	ru_RU
dc.contributor.author	Luchkin Aleksandr Grigorevich	ru_RU
dc.date.accessioned	2024-01-01T00:00:00Z	ru_RU
dc.date.available	2024-01-01T00:00:00Z	ru_RU
dc.date.issued	2024	ru_RU
dc.identifier.citation	Ayachi Omar A, Ayachi Amar C, Kashapov N.F, Effect of substrate rotation on the growth behavior and topography of the Ti film deposited over a large area using DC magnetron sputtering with a rectangular target: Simulation approach and experiment//Materials Today Communications. - 2024. - Vol.41, Is.. - Art. �110895.	ru_RU
dc.identifier.uri	https://repository.kpfu.ru/eng/?p_id=308898&p_lang=2	ru_RU
dc.description.abstract	Materials Today Communications	ru_RU
dc.language.iso	ru	ru_RU
dc.subject	Simulation approach and experiment	ru_RU
dc.subject		ru_RU
dc.title	Effect of substrate rotation on the growth behavior and topography of the Ti film deposited over a large area using DC magnetron sputtering with a rectangular target: Simulation approach and experiment	ru_RU
dc.type	Articles in international journals and collections	ru_RU