KFU. Card publication. Sputtering of Silicon Surface during Low-Energy High-Dose Implantation with Silver Ions

KAZAN
FEDERAL UNIVERSITY

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SPUTTERING OF SILICON SURFACE DURING LOW-ENERGY HIGH-DOSE IMPLANTATION WITH SILVER IONS

Form of presentation

Articles in international journals and collections

Year of publication

2020

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Authors, employees of KFU

Rogov Aleksey Mikhaylovich, author

Bibliographic description in the original language

Vorob?ev V.V, Rogov A.M, Nuzhdin V.I, Sputtering of Silicon Surface during Low-Energy High-Dose Implantation with Silver Ions//Technical Physics. - 2020. - Vol.65, Is.7. - P.1156-1162.

Keywords

semiconductors, microscopy, ion implantation

The name of the journal

Technical Physics

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85089092367&doi=10.1134%2fS1063784220070269&partnerID=40&md5=2f7b22a91a1a3cb9940128b2bdf32c66

Please use this ID to quote from or refer to the card

https://repository.kpfu.ru/eng/?p_id=242469&p_lang=2

Full metadata record

Field DC	Value	Language
dc.contributor.author	Rogov Aleksey Mikhaylovich	ru_RU
dc.date.accessioned	2020-01-01T00:00:00Z	ru_RU
dc.date.available	2020-01-01T00:00:00Z	ru_RU
dc.date.issued	2020	ru_RU
dc.identifier.citation	Vorob?ev V.V, Rogov A.M, Nuzhdin V.I, Sputtering of Silicon Surface during Low-Energy High-Dose Implantation with Silver Ions//Technical Physics. - 2020. - Vol.65, Is.7. - P.1156-1162.	ru_RU
dc.identifier.uri	https://repository.kpfu.ru/eng/?p_id=242469&p_lang=2	ru_RU
dc.description.abstract	Technical Physics	ru_RU
dc.language.iso	ru	ru_RU
dc.subject	semiconductors	ru_RU
dc.subject	microscopy	ru_RU
dc.subject	ion implantation	ru_RU
dc.title	Sputtering of Silicon Surface during Low-Energy High-Dose Implantation with Silver Ions	ru_RU
dc.type	Articles in international journals and collections	ru_RU