Kazan (Volga region) Federal University, KFU
KAZAN
FEDERAL UNIVERSITY
 
ELECTRICAL PROPERTIES OF TITANIUM NITRIDE FILMS SYNTHESIZED BY REACTIVE MAGNETRON SPUTTERING
Form of presentationArticles in Russian journals and collections
Year of publication2017
Языканглийский
  • Vakhitov Iskander Rashidovich, author
  • Gumarov Amir Ildusovich, author
  • Kiyamov Ayrat Gazinurovich, author
  • Nikitin Sergey Ivanovich, author
  • Tagirov Lenar Rafgatovich, author
  • Kharincev Sergey Sergeevich, author
  • Yusupov Roman Valerevich, author
  • Yanilkin Igor Vitalevich, author
  • Bibliographic description in the original language Mohammed W. M. et al. Electrical properties of titanium nitride films synthesized by reactive magnetron sputtering //Journal of Physics: Conference Series. – IOP Publishing, 2017. – T. 927. – №. 1. – S. 012036.
    Annotation Reactive dc magnetron sputtering was employed to produce thin films of titanium nitride using titanium metallic target, argon as the plasma gas and nitrogen as the reactive gas. A set of the films was studied deposited on the Si, fused silica and crystalline (001) MgO substrates with various deposition conditions. The films deposited on the Si and SiO2 substrates are polycrystalline while deposited at slow rate to the heated to 600C MgO substrate are highly epitaxial according both to XRD and LEED data. Electrical resistivity of the films was measured by means of the four-probe van der Pauw method.
    Keywords Deposition conditions,metallic targets, MgO substrate, polycrystalline, reactive DC magnetron sputtering, reactive magnetron sputtering, titanium nitride films, Van der Pauw method
    The name of the journal Journal of Physics: Conference Series
    Please use this ID to quote from or refer to the card https://repository.kpfu.ru/eng/?p_id=173295&p_lang=2

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